专利名称：SELF-ASSEMBLY OF NANOSTRUCTURES发明人：SHU-JEN HAN,BHARAT KUMAR,GEORGE S.
TULEVSKI
申请号：US15488762申请日：20170417
公开号：US20180111834A1公开日：20180426
专利附图：
摘要：Structures and methods that include selective electrostatic placement based ona dipole-to-dipole interaction of electron-rich carbon nanotubes onto an electron-deficient pre-patterned surface. The structure includes a substrate with a first surface
having a first isoelectric point and at least one additional surface having a secondisoelectric point. A self-assembled monolayer is selectively formed on the first surfaceand includes an electron deficient compound including a deprotonated pendant
hydroxamic acid or a pendant phosphonic acid group or a pendant catechol group boundto the first surface. An organic solvent can be used to deposit the electron rich carbonnanotubes on the self-assembled monolayer.
申请人：INTERNATIONAL BUSINESS MACHINES CORPORATION
地址：Armonk NY US
国籍：US
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