专利名称：Method of making a structure of
interference filters
发明人：EDLINGER, JOHANNES,SPERGER,
REINHARD,SIMOTTI, MARIA
申请号：EP04000793.2申请日：19990121公开号：EP1437606A3公开日：20041208
专利附图：
摘要：A color filter is produced by a liftoff technique in which a color filter layersystem is applied onto a structured lacquer layer by low temperature plasma-assisted
deposition. A color filter layer structure is produced on a substrate by a liftoff techniquein which a structured lacquer layer is applied onto the substrate, a color filter layersystem is applied by plasma-assisted coating at not more than 150 degreesC and thenthe lacquer regions are removed together with overlying regions of the color filter layersystem. An Independent claim is also included for a color filter structure array on asubstrate, in which the first layer, adjacent the substrate, consists of an optically neutrallayer preferably of SiO2 or SiO.
申请人：UNAXIS TRADING AG
地址：9477 Trübbach CH
国籍：CH
代理机构：Troesch Scheidegger Werner AG
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