专利名称：Hollow cathode plasma source for bio and
chemical decotaminiation of air and surfaces
发明人：S. Ismat Shah,Anshu Pradhan申请号：US11989562申请日：20060728
公开号：US20090308730A1公开日：20091217
专利附图：
摘要：Hollow cathode source pollution abatement systems for the remediation ofchemical and microbiological pollutants are disclosed. The systems comprise a plasmagenerator having a hollow cathode source (HCS) for generating plasma to break down
pollutant chemicals and microorganisms into simpler byproducts. The byproducts aretrapped on an inner surface of the HCS. The systems allow for elimination of pollutantchemicals and microorganisms from air or gas streams as well as from the surfaces ofarticles. Methods of operating such systems are also disclosed.
申请人：S. Ismat Shah,Anshu Pradhan
地址：Wilmington DE US,Fremont CA US
国籍：US,US
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