专利名称：CHEMICAL-MECHANICAL POLISHING
COMPOSITION CONTAINING ZIRCONIAAND METAL OXIDIZER
发明人：FU, Lin,GRUMBINE, Steven,STENDER,
Matthias
申请号：EP14745617.2申请日：20140123公开号：EP2951260A1公开日：20151209
摘要：The invention provides a chemical-mechanical polishing composition and amethod of chemically-mechanically polishing a substrate with the chemical-mechanicalpolishing composition. The polishing composition comprises (a) abrasive particles,wherein the abrasive particles comprise zirconia, (b) at least one metal ion oxidizer,wherein the at least one metal ion oxidizer comprises metal ions of Co3+, Au+, Ag+, Pt2+,Hg2+, Cr3+, Fe3+, Ce4+, or Cu2+, and (c) an aqueous carrier, wherein the pH of thechemical-mechanical polishing composition is in the range of about 1 to about 7, andwherein the chemical-mechanical polishing composition does not contain a peroxy-typeoxidizer.
申请人：Cabot Microelectronics Corporation
地址：Legal Department 870 North Commons Drive Aurora, Illinois 60504 US
国籍：US
代理机构：Trueman, Lucy Petra
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